AlixLabs Raises €15M Series A To Scale Atomic-level Etching Technology

The round builds on a €14.1 million investment announced in November 2025 from Global Brain and other institutional investors, with the remaining amount completed in the first quarter of 2026.

Founded in 2019 as a spinout from Lund University, AlixLabs is a Swedish semiconductor company specialising in Atomic Layer Etching (ALE) technology.

It focuses on enabling the production of ultra-small nanostructures below 20 nanometers, supporting the next generation of chip manufacturing.

The company’s proprietary APS™ (Atomic Pitch Splitting) technology allows more efficient and precise fabrication beyond traditional lithography limits. By reducing process steps, AlixLabs helps lower manufacturing costs while increasing throughput.

Its solutions integrate with existing semiconductor production workflows and aim to reduce power and water consumption, supporting more sustainable chip manufacturing.

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The recent funding will help accelerate product development, expand technical capabilities and strengthen partnerships with semiconductor manufacturers.

“Stephen Industries brings deep industrial expertise and a proven ability to scale companies in adjacent technology domains. Kustaa’s experience with Picosun is especially valuable as we move from development toward broader commercialisation of our APS™ platform,” said Jonas Sundqvist, CEO of AlixLabs.

“AlixLabs operates in a highly promising space within semiconductor process technology. Having seen firsthand how ALD evolved from a niche innovation to a critical industry standard, I see strong parallels with ALE. AlixLabs has the potential to follow a similar trajectory,” said Kustaa Poutiainen, Chairperson and President of Stephen Industries.

About AlixLabs

AlixLabs is a semiconductor company developing Atomic Layer Etching technology for advanced nanofabrication. Its APS™ method enables precise damage free manufacturing of structures below 20 nanometers supporting efficient high-precision production for next generation semiconductor devices and nanoscale applications.